Borophosphosilicate glass incorporated with fluorine for low the

BPSG planarization method having improved planarity and reduced

Buffer layer for selective SiGe growth for uniform nucleation

C x H y sacrificial layer for cu/low-k interconnects

C x H y sacrificial layer for cu/low-k interconnects

Capacitor fabrication method

Capacitor with hafnium, lanthanum and oxygen mixed...

Capacitor with nano-composite dielectric layer and method...

Capacitor, methods of forming capacitors, methods for...

Capacitors and methods with praseodymium oxide insulators

Carbon and halogen doped silicate glass dielectric layer and...

Carbon doped oxide deposition

Carbon nanotube device and process for manufacturing same

Carbon nanotube device, method of manufacturing the same,...

Carbon nanotube growth

Carbon nanotube structure and method of vertically aligning...

Carbon nanotube structure and method of vertically aligning...

Catalytic breakdown of reactant gases in chemical vapor...

Catalytic deposition method for a semiconductor surface...

Charged particle deposition of electrically insulating films