H2 diffusion barrier formation by nitrogen incorporation in...

H2-based plasma treatment to eliminate within-batch and...

H2-or H2/N2-plasma treatment to prevent organic ILD degradation

Hafnium lanthanide oxynitride films

Hafnium tantalum oxynitride dielectric

HDP deposition hillock suppression method in integrated...

HDP process for high aspect ratio gap filling

HDP-CVD deposition process for filling high aspect ratio gaps

HDP-CVD deposition process for filling high aspect ratio gaps

HDP-CVD deposition process for filling high aspect ratio gaps

HDP-CVD method for forming passivation layers with enhanced...

HDPCVD process and method for improving uniformity of film...

He treatment to improve low-k adhesion property

Heat processing method and apparatus for semiconductor process

Heat treatment apparatus, heat treatment method, and...

Heat treatment of a tantalum oxide film

Hermetic cap layers formed on low-k films by plasma enhanced...

Hermetic silicon carbide

Hexakis(monohydrocarbylamino)disilanes and method for the...

High crack resistance nitride process