Radiation hardened dielectric for EEPROM

Rapid acceleration methods for global planarization of...

Rapid deposition of borosilicate glass films

Rapid thermal annealing of doped polycrystalline silicon...

Rapid thermal etch and rapid thermal oxidation

Rapid thermal etch and rapid thermal oxidation

Reactive gaseous deposition precursor feed apparatus

Reactor design for reduced particulate generation

Reactor design for reduced particulate generation

Reactor for processing a workpiece using sonic energy

Reactor precoating for reduced stress and uniform CVD

Recovery of hydrophobicity of low-k and ultra low-k...

Reduced particulate etching

Reduced water adsorption for interlayer dielectric

Reducing line to line capacitance using oriented dielectric...

Reduction of black silicon in semiconductor fabrication

Reduction of charge loss in nonvolatile memory cells by phosphor

Reduction of etch-rate drift in HDP processes

Reduction of mobile ion and metal contamination in HDP-CVD chamb

Reduction of n-channel parasitic transistor leakage by using low