Charged particle deposition of electrically insulating films

Details Charged particle deposition of electrically insulating films Charged particle deposition of electrically insulating films

1997-04-28

1998-10-27

Bowers, Jr., Charles L.

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

438790, 427526, 427527, 427529, 427531, 25049221, H01L 21316

Patent

active

058277862

ABSTRACT:
In forming an insulating film upon a selected region of a sample, a gaseous vapor is directed over the selected region for depositing a compound of the gaseous vapor containing elements of the insulating film. A charged particle beam is directed toward the selected region in order to decompose the deposited compound and provide the desired insulating film.

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