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F ion implantation into oxide films to form low-K intermetal die

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication method for gate structure having gate dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication method for organic semiconductor transistor...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication method for organic semiconductor transistor...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication method for semiconductor integrated devices

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication method for semiconductor integrated devices

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication method of semiconductor device using low-k film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Fabrication methods of semiconductor integrated circuit...

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Fabrication of a semiconductor device with an interlayer...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication of enclosed nanochannels using silica nanoparticles

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication of metal oxide structure for a gate dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Fabrication of photonic band gap materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Fabrication of pure and modified Ta2O5 thin film with...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Fabrication of self-assembled monolayers

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Fabrication of semiconductor materials and devices with...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Fabrication process of a semiconductor integrated circuit...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Fabrication process of a semiconductor integrated circuit...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Fabrication process of a semiconductor integrated circuit...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Fabrication process of semiconductor device

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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