Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Reexamination Certificate
2005-12-30
2008-11-04
Lindsay, Jr., Walter (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
C438S761000, C257SE51001, C977S700000, C977S902000
Reexamination Certificate
active
07446053
ABSTRACT:
A capacitor with a nano-composite dielectric layer and a method for fabricating the same are provided. A dielectric layer of a capacitor includes a nano-composite layer formed by mixing X number of different sub-layers, X being a positive integer greater than approximately 1. A method for forming a dielectric layer of a capacitor includes: forming a nano-composite layer by mixing X number of different sub-layers in the form of a nano-composition, X being a positive integer greater than approximately 1; and densifying the nano-composite layer.
REFERENCES:
patent: 5583068 (1996-12-01), Jones, Jr. et al.
patent: 6660660 (2003-12-01), Haukka et al.
patent: 6797525 (2004-09-01), Green et al.
patent: 6825092 (2004-11-01), Zurcher et al.
patent: 2002/0190294 (2002-12-01), Iizuka et al.
patent: 2002/0197793 (2002-12-01), Dornfest et al.
patent: 2004/0082126 (2004-04-01), Park et al.
patent: 2004/0135492 (2004-07-01), Deguchi
patent: 2004/0141223 (2004-07-01), Kurashina et al.
patent: 2004/0191983 (2004-09-01), Basceri et al.
patent: 2005/0070063 (2005-03-01), Im et al.
patent: 1437618 (2007-01-01), None
patent: 2001-0082118 (2001-08-01), None
patent: 10-0531629 (2005-11-01), None
patent: 388098 (2000-04-01), None
Hong Kwon
Kil Deok-Sin
Yeom Seung-Jin
Blakely & Sokoloff, Taylor & Zafman
Hynix / Semiconductor Inc.
Lindsay, Jr. Walter
Mustapha Abdulfattah
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