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Selective plasma etching of silicon nitride in presence of silic

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Selective plasma etching of silicon nitride in presence of silic

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Selective polish for fabricating electronic devices

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Selective polishing with slurries containing polyelectrolytes

Semiconductor device manufacturing: process – Chemical etching
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Selective removal of etching residues

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Selective removal of tantalum-containing barrier layer...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Selective removal of TixNy

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Selective removal of vertical portions of a film

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Selective SAC etch process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Selective silicon etch process

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Selective slurries for the formation of conductive structures

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Selective surface exposure, cleans and conditioning of the...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Selective titanium nitride strip

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Selective treatment of microelectric workpiece surfaces

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Selectively accelerated plating of metal features

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Selectively accelerated plating of metal features

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Selectively converted inter-layer dielectric

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Selectivity oxide-to-oxynitride etch process using a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Self aligned buried plate

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Self aligned method to define features smaller than the resoluti

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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