Selective polish for fabricating electronic devices

Details Selective polish for fabricating electronic devices Selective polish for fabricating electronic devices

2005-01-06

2008-11-04

Whitehead, Jr., Carl (Department: 2813)

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

C438S693000, C438S756000, C051S307000

Reexamination Certificate

active

07446046

ABSTRACT:
A selective polish for fabricating electronic devices is disclosed. The selective polish may include the use of a slurry that facilitates the selective polish of a first component but does not substantially polish a second component.

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Fazio, et al., “ETOX™ Flash Memory Technology: Scaling and Integration Challenges,” Intel® Technology Journal, Semiconductor Technology and, no copy submitted.

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