Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent
1995-10-27
1998-09-08
Powell, William
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
156345, 134 33, H01L 2100
Patent
active
058045074
ABSTRACT:
An apparatus for polishing semiconductor wafers and other workpieces that includes a polishing pads mounted on respective platens at multiple polishing stations. Multiple wafer heads, at least one greater in number than the number of polishing stations, can be loaded with individual wafers. The wafer heads are suspended from a carousel, which provides circumferential positioning of the heads relative to the polishing pads, and the wafer heads oscillate radially as supported by the carousel to sweep linearly across the respective pads in radial directions with respect to the rotatable carousel. Each polishing station includes a pad conditioner to recondition the polishing pad so that it retains a high polishing rate. Washing stations may be disposed between polishing stations and between the polishing stations and a transfer and washing station to wash the wafer as the carousel moves. A transfer and washing station is disposed similarly to the polishing pads. The carousel simultaneously positions one of the heads over the transfer and washing station while the remaining heads are located over polishing stations for wafer polishing so that loading and unloading of wafers and washing of wafers and wafer heads can be performed concurrently with wafer polishing. A robot positioned to the side of the polishing apparatus automatically moves cassettes filled with wafers into a holding tub, and transfers individual wafers vertically held in the cassettes between the holding tub and the transfer and washing station. The multiple polishing pads can be used to sequentially polish a wafer held in a wafer head in a step of multiple steps. The steps may be equivalent, may provide polishes of different finish, or may be directed to polishing different levels.
REFERENCES:
patent: 2998680 (1961-09-01), Lipkins
patent: 3518798 (1970-07-01), Boettcher
patent: 3659386 (1972-05-01), Goetz et al.
patent: 3665648 (1972-05-01), Seisakusho
patent: 3731435 (1973-05-01), Boettcher et al.
patent: 3762103 (1973-10-01), Nielsen
patent: 3913271 (1975-10-01), Boettcher
patent: 4020600 (1977-05-01), Day
patent: 4021278 (1977-05-01), Hood et al.
patent: 4502252 (1985-03-01), Iwabuchi
patent: 4509298 (1985-04-01), Klievoneit
patent: 4583325 (1986-04-01), Tabuchi
patent: 4653231 (1987-03-01), Cronkhite et al.
patent: 4944119 (1990-07-01), Gill, Jr. et al.
patent: 5081051 (1992-01-01), Mattingly et al.
patent: 5081795 (1992-01-01), Tanaka et al.
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5224304 (1993-07-01), Cesna
patent: 5232875 (1993-08-01), Tuttle et al.
patent: 5246525 (1993-09-01), Sato
patent: 5317778 (1994-06-01), Kudo et al.
patent: 5329732 (1994-07-01), Karlsrud et al.
patent: 5421768 (1995-06-01), Fujiwara et al.
patent: 5443416 (1995-08-01), Volodarsky et al.
patent: 5456627 (1995-10-01), Jackson et al.
patent: 5478435 (1995-12-01), Murphy et al.
patent: 5486131 (1996-01-01), Cesna et al.
patent: 5498199 (1996-03-01), Karlsrud
patent: 5692947 (1997-12-01), Talieh et al.
Gantvarg Eugene
Lee Harry Q.
Perlov Ilya
Somekh Sasson
Tolles Robert D.
Applied Materials Inc.
Einschlag Michael B.
Guenzer Charles S.
Mulcahy Robert W.
Powell William
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