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In-situ sequential high density plasma deposition and etch...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In-situ sequential silicon containing hard mask layer/silicon la

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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In-situ SOG etchback and deposition for IMD process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Increased polish removal rate of dielectric layers using...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Increasing programming silicide process window by forming...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Indirect endpoint detection by chemical reaction

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Inert plasma gas surface cleaning process performed insitu...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Inexpensive process for producing a multiplicity of...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Infinitely selective photoresist mask etch

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Inhibition of tin oxide formation in lead free interconnect...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Innovative method of hard mask removal

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Innovative method to build a high precision analog capacitor...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Insitu hardmask and metal etch in a single etcher

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Insitu oxidation for polishing non-oxide ceramics

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Insitu post etch process to remove remaining photoresist and...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Inspection method of compound semiconductor substrate,...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Insulated pad conditioner and method of using same

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Insulating layer patterning method, insulating layer formed...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Insulation film etching method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Integrated arc and polysilicon etching process

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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