Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2011-03-22
2011-03-22
Vinh, Lan (Department: 1713)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S714000, C438S723000, C134S001100
Reexamination Certificate
active
07910489
ABSTRACT:
A method for etching features into an etch layer disposed below a photoresist mask without an intermediate hardmask is provided. A plurality of etch cycles are provided. Each etch cycle comprises providing a deposition etch phase that etches features into the etch layer and deposits polymer on sidewalls of the features and over the photoresist and providing a cleaning phase that removes polymer deposited on the sidewalls.
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Choi Daehan
Cirigliano Peter
Heo Dongho
Kim Ji Soo
Lee Sang-heon
Beyer Law Group LLP
Lam Research Corporation
Vinh Lan
LandOfFree
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