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Method for etching

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a dielectric layer formed upon a barrier...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a hard mask layer and a metal layer

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a metal layer with dimensional control

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a platinum layer in a semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a poly-silicon layer of a semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a silicided poly using fluorine-based...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a silicon-containing ARC layer to reduce...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a substrate and a device formed using the...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a substrate and a device formed using the...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a tapered bore in a silicon substrate,...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a trench having rounded top and bottom...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching a trench having rounded top corners in a...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching an antireflective coating and for...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching and/or patterning a silicon-containing layer

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching anti-reflective coating film

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching contact

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching damaged zones on an edge of a semiconductor s

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching dielectric layers with high selectivity and l

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Method for etching dielectric using fluorohydrocarbon gas, NH.su

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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