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Plasma reactor and processes using RF inductive coupling and sca

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma reactor having a dual mode RF power application

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma reactor having a symmetric parallel conductor coil...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma reactor with enhanced plasma uniformity by gas addition,

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma reactor with heated source of a polymer-hardening precurs

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma state monitoring to control etching processes and...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Plasma state monitoring to control etching processes and...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Plasma surface treatment method and resulting device

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma surface treatment method and resulting device

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma surface treatment method, quartz member, plasma...

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma treating apparatus and plasma treating method

Etching a substrate: processes – Gas phase etching of substrate
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Plasma treatment apparatus

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma treatment apparatus and method for operating same

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma treatment method and plasma treatment system

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma treatment method utilizing an amplitude-modulated high fr

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma uniformity control for an inductive plasma source

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma-etching method and apparatus therefor

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Plasma-inert cover and plasma cleaning process

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Polysilicon/polycide etch process for sub-micron gate stacks

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Position detecting method and apparatus

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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