Plasma treatment apparatus and method for operating same

Details Plasma treatment apparatus and method for operating same Plasma treatment apparatus and method for operating same

1994-05-03

1996-05-14

Dang, Thi

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

156345, 134 11, 118723E, 118719, H05H 100

Patent

active

055159869

ABSTRACT:
An apparatus for plasma treating workpieces in vacuum includes a stack of plasma chambers (20). Handling of workpieces to and from the plasma chambers of the stack is performed in parallelism by one handling device and through lateral handling openings of the plasma chambers. The handling device is rotatable around an axis parallel to the handling openings of the plasma chambers and comprises transport apparatus simultaneously movable radially with respect to the axis of rotation towards and from the handling openings.

REFERENCES:
patent: 4798739 (1989-01-01), Schmitt
patent: 4987004 (1991-01-01), Yamazaki et al.
patent: 4989543 (1991-02-01), Schmitt
patent: 5112641 (1992-05-01), Harada et al.
patent: 5217340 (1993-06-01), Harada et al.

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