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Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Asymmetrical p-channel transistor formed by nitrided oxide and l

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Asymmetrical P-channel transistor having a boron migration barri

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Asymmetrical transistor formed from a gate conductor of unequal

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposited nanolaminates of HfO 2 /ZrO 2 films...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposited nanolaminates of HfO2/ZrO2 films as...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposited ZrAl x O y dielectric layers...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposition of hafnium lanthanum oxides

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposition of interpoly oxides in a...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposition of Zr 3 N 4 /ZrO 2 films as gate...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposition of Zr x Hf y Sn 1-x-y O 2 films...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposition of Zr x Hf y Sn 1-x-y O 2 films...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposition processes for non-volatile memory...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer deposition processes for non-volatile memory...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Atomic layer-deposited LaAlO3 films for gate dielectrics

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Avoiding abnormal capacitor formation by an offline edge-bead ri

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Avoiding field oxide gouging in shallow trench isolation...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Avoiding plasma charging in integrated circuits

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Back gate FinFET SRAM

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Back-biased MOS device fabrication method