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Method of structuring layers with a polysilicon layer and an...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method of suppressing void formation in a metal line

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method of titanium/titanium nitride integration

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method of trimming technology

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method of trimming technology

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to control the interfacial layer for deposition of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to deposit SiOCH films with dielectric constant below...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to enhance the formation of nucleation sites on...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to fabricate a double-polysilicon gate structure for...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to fabricate a floating gate with a sloping sidewall...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to fabricate the MOS gate

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to form a smooth gate polysilicon sidewall in the...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to form an L-shaped silicon nitride sidewall spacer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to form high k dielectric and silicide to reduce poly...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to grow self-aligned silicon on a poly-gate, source and d

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to improve TiSix salicide formation

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to increase contact area

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Utility Patent

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Method to prevent metal oxide formation during polycide...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to protect gate stack material during source/drain reoxid

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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Method to reduce device contact resistance using a hydrogen...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
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