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Deposition of nanoporous silica films using a closed cup coater

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of phosphosilicate glass film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of silicon dioxide and silicon oxynitride using bis(t

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of silicon layers for active matrix liquid...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Deposition of stable dielectric films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of super thin PECVD SiO.sub.2 in multiple deposition

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition of tensile and compressive stressed materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Deposition of ZrA1ON films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition process for forming void-free dielectric layer

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deposition profile modification through process chemistry

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Deuterium incorporated nitride

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Develop processing method of a resist surface of a substrate...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Develop processing method of a resist surface on a substrate...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Device and method for processing substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Device fabrication involving surface planarization

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Utilizing reflow
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Device having dual etch stop liner and reformed silicide...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Devices and methods of preventing plasma charging damage in...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Dielectric coatings and use in capacitors

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Dielectric cure for reducing oxygen vacancies

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Dielectric film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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