Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Reexamination Certificate
2006-02-07
2011-10-04
Roman, Angel (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
C438S778000, C438S787000, C438S789000, C257SE21487
Reexamination Certificate
active
08030219
ABSTRACT:
A coated substrate product is described comprising a substrate and a dielectric coating material comprising carbon, hydrogen, silicon, and oxygen. According to the method, the substrate is processed by plasma cleaning the surface and then depositing a dielectric coating by a suitable plasma process. The coating may contain one or more layers. The substrate may be a rigid material or a thin film or foil. The coated products of this invention have superior dielectric material properties and utility as substrates for the manufacture of rolled or parallel plate capacitors with high energy densities.
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Finke Steven J.
Kimock Fred M.
Wu Richard L. C.
Crall Kristin M.
K Systems Corporation
Kilpatrick Townsend & Stockton LLP
Morgan Advanced Ceramics, Inc.
Roman Angel
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