Dielectric coatings and use in capacitors

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S778000, C438S787000, C438S789000, C257SE21487

Reexamination Certificate

active

08030219

ABSTRACT:
A coated substrate product is described comprising a substrate and a dielectric coating material comprising carbon, hydrogen, silicon, and oxygen. According to the method, the substrate is processed by plasma cleaning the surface and then depositing a dielectric coating by a suitable plasma process. The coating may contain one or more layers. The substrate may be a rigid material or a thin film or foil. The coated products of this invention have superior dielectric material properties and utility as substrates for the manufacture of rolled or parallel plate capacitors with high energy densities.

REFERENCES:
patent: 4168330 (1979-09-01), Kaganowicz
patent: 4490229 (1984-12-01), Mirtich et al.
patent: 5508368 (1996-04-01), Knapp et al.
patent: 5618619 (1997-04-01), Petrmichl et al.
patent: 5844770 (1998-12-01), Fries-Carr et al.
patent: 5888593 (1999-03-01), Petrmichl et al.
patent: 5973447 (1999-10-01), Mahoney et al.
patent: RE37294 (2001-07-01), Knapp et al.
patent: 6949392 (2005-09-01), Gill et al.
patent: 2002/0032073 (2002-03-01), Rogers et al.
patent: 2005/0194619 (2005-09-01), Edelstein et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dielectric coatings and use in capacitors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dielectric coatings and use in capacitors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dielectric coatings and use in capacitors will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4282106

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.