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Oxygen plasma treatment for enhanced HDP-CVD gapfill

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Oxynitride GTE dielectrics using NH.sub.3 gas

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Ozone treatment method and ozone treatment apparatus

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Ozone-enhanced oxidation for high-k dielectric semiconductor...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Ozone-teos method for forming with attenuated surface...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Particle reduction in PECVD processes for depositing low-k...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Passivation integrity improvements

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Passivation layer for a circuit device and method of...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Passivation layer of semiconductor device and method for forming

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Passivation of aluminum nitride substrates

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Passivation of copper with ammonia-free silicon nitride and appl

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Passivation of copper with ammonia-free silicon nitride and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Passivation of oxide-compound semiconductor interfaces

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Passive elements, articles, packages, semiconductor...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Pattern and fabricating method therefor, device and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Pattern and its forming method of liquid crystal display device

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Pattern forming method for flattening an organic film for a...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Patterned ceramic films and method for producing the same

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Patterned functionalized silicon surfaces

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Patterned plasma nitridation for selective epi and silicide...

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