Patterned functionalized silicon surfaces

Details Patterned functionalized silicon surfaces Patterned functionalized silicon surfaces

2006-08-04

2009-06-30

Ghyka, Alexander G (Department: 2812)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S765000, C977S857000

Reexamination Certificate

active

07553776

ABSTRACT:
The present invention provides a method for preparing a silicon substrate and a silicon substrate having a silicon surface comprising a pattern of covalently bound monolayers. Each of the monolayers comprises an alkyne, wherein at least a portion of each monolayer is no more than about 5 molecules of the alkyne wide.

REFERENCES:
patent: 5565529 (1996-10-01), Babich et al.
patent: 5908692 (1999-06-01), Hamers et al.
patent: 6063714 (2000-05-01), Smith et al.
patent: 6147159 (2000-11-01), Hu et al.
patent: 6288390 (2001-09-01), Siuzdak et al.
patent: 6326215 (2001-12-01), Keen
patent: 6403382 (2002-06-01), Zhu et al.
patent: 6433359 (2002-08-01), Kelley et al.
patent: 6485986 (2002-11-01), Buriak et al.
patent: 6943054 (2005-09-01), Bocian et al.
patent: 2003/0021967 (2003-01-01), Sagiv et al.
patent: 2004/0023479 (2004-02-01), Tour et al.
patent: 2004/0183069 (2004-09-01), Afzali-Ardakani et al.
patent: 2004/0203256 (2004-10-01), Yang et al.
patent: 2005/0056828 (2005-03-01), Wada et al.
patent: 2005/0093162 (2005-05-01), Gracias
patent: 2005/0208142 (2005-09-01), Zheng et al.
patent: 2005/0227405 (2005-10-01), Sudholter et al.
patent: 2005/0266697 (2005-12-01), Korgel et al.
patent: WO 99/37409 (1999-07-01), None
patent: WO 00/26019 (2000-05-01), None
Robins et al., “Anodic and cathodic electrografting of alkynes on porous silicon”, 1999, Chemical Communications, pp. 2479-2480.
Hurley et al., “Nanopatterning of alkynes on hydrogen-terminated silicon surfaces by scanning probe-induced cathodic electrografting”, Aug. 2003, Journal of the American Chemical Society, 125, pp. 1134-11339.
Hoeppener et al., “Constructive Microlithography: Electrochemical Printing of Monolayer Template Patterns Extends Constructive Nanolithography to the Micrometer-Millimeter Dimension Range”, May 2003, Nano Letters, vol. 3 No. 6, pp. 761-767.
Canham, L.T.:Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers,Appl. Phys. Lett., 57, 1046-1048, (1990).
Office Action for U.S. Appl. No. 11/010,100 dated Mar. 21, 2008 (8 pages).
Office Action for U.S. Appl. No. 11/010,100 dated Sep. 19, 2007 (6 pages).
Office Action for U.S. Appl. No. 11/010,100 dated Apr. 6, 2007 (10 pages).
Notice of Allowance for U.S. Appl. No. 10/887,792 (now U.S. Patent No. 7,091,517) dated Mar. 21, 2006 (7 pages).

Affiliated with

Also associated with

Rating

Patterned functionalized silicon surfaces does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Patterned functionalized silicon surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Patterned functionalized silicon surfaces will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4146478