Pattern and its forming method of liquid crystal display device

Details Pattern and its forming method of liquid crystal display device Pattern and its forming method of liquid crystal display device

2003-04-25

2004-07-06

Thompson, Craig A. (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

Reexamination Certificate

active

06759348

ABSTRACT:

This application claims the benefit of Korean Application No. 2002-88447 filed in Korea on Dec. 31, 2002, which is hereby incorporated by reference in its entirety.
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a method for forming a Liquid Crystal Display (hereinafter, LCD) device and particularly, a method for forming a pattern in the LCD device.
2. Description of the Related Art
In display devices, particularly in flat panel display devices, pixels are arranged in a matrix. Further, in flat panel devices, such as LCD devices, an active device, such as Thin Film Transistors (hereinafter, TFTs) are positioned in respective pixels for driving the pixels in the display devices. This method of driving the display device is called the active matrix driving method because the active devices are arranged in the respective pixels aligned in a matrix form.
FIG. 1
is a plan view of a pixel in a related art LCD device using the active matrix method. The active device is a TFT
10
. As shown in
FIG. 1
, gate lines
2
arranged lengthwise and data lines
4
arranged widthwise define a pixel. The TFT
10
for independently controlling the driving of the respective pixel is formed near where one of the gate lines and one of the data lines cross over each other. The TFT
10
includes a gate electrode
2
a
, which is connected with one of the gate lines
2
, a semiconductor
5
that is formed on the gate electrode
2
a
, and source and drain electrodes
4
a
and
4
b
that are formed on the semiconductor layer
5
. The TFT
10
is activated when a scan signal is applied to the gate electrode
2
a
by one of the gate lines
2
. In the pixel, a pixel electrode
7
, which is connected to the drain electrodes
4
b
, is supplied with an image signal through the source and drain electrodes
4
a
and
4
b
when the semiconductor layer
5
is activated by the gate electrode
2
a
. The pixel electrode
7
is connected with the drain electrode
4
b
through the first contact hole
8
a
. A storage line
6
and a storage electrode
11
, which overlaps the storage line
6
, are positioned in the pixel defined by the gate line
2
and the data line
4
to form a storage capacitor Cst. The storage electrode
11
is connected with the pixel electrode
7
through a second contact hole
8
b.
FIG. 2
is a cross-sectional view taken along section line II-II′ of
FIG. 1
showing a TFT
10
and storage capacitor Cst positioned inside the pixel. As shown in
FIG. 2
, the TFT
10
includes a substrate
1
made of transparent insulating material, such as glass, a gate electrode
2
a
formed on the substrate
1
, a gate insulating layer
13
deposited over the entire substrate
1
, a semiconductor layer
5
formed on the gate insulating layer
13
and source/drain electrodes
4
a
and
4
b
formed on the semiconductor layer
5
, and a passivation layer
15
formed on the source/drain electrodes
4
a
and
4
b
to protect the device, and a pixel electrode
7
connected with the drain electrode
4
b
through the first contact hole
8
a.
The storage capacitor Cst includes a storage line
6
formed during the same series of patterning processes as the gate electrode
2
a
of the TFT, and a storage electrode
11
formed during the same series of patterning processes as the source and drain electrodes
4
a
and
4
b
. A gate insulating layer
13
is formed between the storage line
6
and storage electrode
11
. A second contact hole
8
b
for exposing a part of the storage electrode
11
is formed in the passivation layer
15
. The storage electrode
11
is electrically connected with the pixel electrode
7
through the second contact hole
8
b
. The storage capacitor Cst charges via a gate voltage while a gate signal is applied to the gate electrode
2
a
, and then holds charge until the gate electrode
2
is selected in the next frame to prevent voltage change of the pixel electrode
7
.
As described above, the LCD device is fabricated by a photolithography processing having a series of repeated processes, such as coating a photo-resist, aligning, exposing, developing, rinsing and the like to develop different portions of a pattern. Because a plurality of photolithography processes must be repeated to complete the LCD device, the productivity is degraded.
SUMMARY OF THE INVENTION
Accordingly, the present invention is directed to a flat display device that substantially obviates one or more of the problems due to limitations and disadvantages of the related art.
Therefore, an object of the present invention is to provide a method for forming a pattern on a liquid crystal display (hereinafter, as LCD) device, capable of forming a pattern through a printing processing that does not have to be repeated.
Another object of the present invention is to provide a method for forming an accurate pattern in both a non-rollout direction and a rollout direction of the pattern.
Still another object of the present invention is to provide a pattern feature for forming an accurate pattern.
To achieve these and other advantages and in accordance with the purpose of the present invention, as embodied and broadly described herein, there is provided a method for forming a pattern including filling a resist in a groove of a cliché corresponding to the position of the pattern to be formed, transferring the resist which is filled in the groove onto a printing roll by rotating the printing roll in a direction parallel to the longest portion lengthwise direction of a pattern formed in cliché, and applying the resist on an etching object layer by rotating the printing roll along the etching object layer on a substrate.
In another aspect, a method for forming a pattern includes providing a cliché in which a groove is formed in a region corresponding to a shape of a pattern to be formed, filling a resist into the groove and removing the resist which remains on the surface of the cliché except for resist within the groove by pulling a doctor blade in a pulling direction parallel a longest portion lengthwise direction of the groove to flatten the resist, transferring the resist onto a printing roll by rotating the printing roll on the cliché along the longest portion lengthwise direction of the groove, and applying the resist on the etching object layer by rotating the printing roll along the an etching object layer on a substrate.
The foregoing and other objects, features, aspects and advantages of the present invention will become more apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings.


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