Patterned ceramic films and method for producing the same

Details Patterned ceramic films and method for producing the same Patterned ceramic films and method for producing the same

2006-07-04

2006-07-04

Dang, Phuc T. (Department: 2818)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S681000, C438S950000

Reexamination Certificate

active

07071121

ABSTRACT:
A ceramic film is useful as ion-conducting ceramics, electrodes, hard ceramic coatings, transparent conducting oxides, transparent semiconducting oxides, ferroelectric oxides, and dielectric oxides. The ceramic film may be produced from a liquid precursor solution.

REFERENCES:
patent: 4248921 (1981-02-01), Steigerwald et al.
patent: 4952556 (1990-08-01), Mantese et al.
patent: 5021398 (1991-06-01), Sharma et al.
patent: 5262392 (1993-11-01), Hung et al.
patent: 5916733 (1999-06-01), Koyama
patent: 5942376 (1999-08-01), Uchida et al.
patent: 6177357 (2001-01-01), Lu
patent: 6194129 (2001-02-01), Kasono et al.
patent: 6274063 (2001-08-01), Li et al.
patent: 6284314 (2001-09-01), Kato et al.
patent: 6352763 (2002-03-01), Dillon et al.
patent: 6399282 (2002-06-01), Kubota et al.
patent: 6565763 (2003-05-01), Asakawa et al.
patent: 6571384 (2003-05-01), Shin et al.
patent: 2002/0083863 (2002-07-01), Mitamura
patent: 2003/0113657 (2003-06-01), Nagahara et al.
patent: 2003/0157250 (2003-08-01), Mukherjee
patent: 0 296 719 (1988-12-01), None

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