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Line edge roughness reduction

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Liquid phase deposition method for forming silicon dioxide film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Liquid phase deposition method for growing a titanium dioxide on

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Liquid phase deposition method for growing silicon dioxide film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Liquid precursors for the CVD deposition of amorphous carbon...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Liquid-phase growth method, liquid-phase growth apparatus,...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Load lock chamber having two dual slot regions

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Local plasma processing

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Local plasma processing

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Localized energy pulse rapid thermal anneal dielectric film...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Lossless co-planar wave guide in CMOS process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Low contamination components for semiconductor processing...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Low dielectric (low k) barrier films with oxygen doping by...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low dielectric constant dielectric films and process for making

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low dielectric constant film and method thereof

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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LOW DIELECTRIC CONSTANT FILM COMPOSED OF BORON, NITROGEN,...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Low dielectric constant films derived by sol-gel processing...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Low dielectric constant insulating films with laminated...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Low dielectric constant insulation in VLSI applications

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Low dielectric constant material and method of processing by...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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