Load lock chamber having two dual slot regions

Details Load lock chamber having two dual slot regions Load lock chamber having two dual slot regions

2006-09-12

2006-09-12

Pham, Long (Department: 2814)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S464000, C438S618000, C438S716000, C438S758000, C438S759000, C438S784000

Reexamination Certificate

active

07105463

ABSTRACT:
Provided herein is a substrate processing system, which comprises a cassette load station; a load lock chamber; a centrally located transfer chamber; and one or more process chambers located about the periphery of the transfer chamber. The load lock chamber comprises double dual slot load locks constructed at same location. Such system may be used for processing substrates for semiconductor manufacturing.

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