Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2005-02-24
2008-08-05
Smith, Matthew S. (Department: 2823)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S758000, C438S759000, C438S767000
Reexamination Certificate
active
07407893
ABSTRACT:
Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas into the processing chamber, wherein the processing gas comprises a carrier gas, hydrogen, and one or more precursor compounds, generating a plasma of the processing gas by applying power from a dual-frequency RF source, and depositing an amorphous carbon layer on the substrate.
REFERENCES:
patent: 4975144 (1990-12-01), Yamazaki et al.
patent: 5022959 (1991-06-01), Itoh et al.
patent: 5262262 (1993-11-01), Yagi et al.
patent: 5461003 (1995-10-01), Havemann et al.
patent: 5674573 (1997-10-01), Mitani et al.
patent: 5759913 (1998-06-01), Fulford, Jr. et al.
patent: 5789320 (1998-08-01), Andricacos et al.
patent: 5830332 (1998-11-01), Babich et al.
patent: 5866920 (1999-02-01), Matsumoto et al.
patent: 5882830 (1999-03-01), Visser et al.
patent: 5900288 (1999-05-01), Kuhman et al.
patent: 5930655 (1999-07-01), Cooney, III et al.
patent: 5981000 (1999-11-01), Grill et al.
patent: 5986344 (1999-11-01), Subramanion et al.
patent: 5998100 (1999-12-01), Azuma et al.
patent: 6008140 (1999-12-01), Ye et al.
patent: 6030901 (2000-02-01), Hopper et al.
patent: 6035803 (2000-03-01), Robles et al.
patent: 6043167 (2000-03-01), Lee et al.
patent: 6054379 (2000-04-01), Yau et al.
patent: 6057226 (2000-05-01), Wong
patent: 6064118 (2000-05-01), Sasaki
patent: 6066577 (2000-05-01), Cooney, III et al.
patent: 6080529 (2000-06-01), Ye et al.
patent: 6098568 (2000-08-01), Raoux et al.
patent: 6140224 (2000-10-01), Lin
patent: 6140226 (2000-10-01), Grill et al.
patent: 6143476 (2000-11-01), Ye et al.
patent: 6153935 (2000-11-01), Edelstein et al.
patent: 6165890 (2000-12-01), Kohl et al.
patent: 6183930 (2001-02-01), Ueda et al.
patent: 6184572 (2001-02-01), Mountsier et al.
patent: 6197704 (2001-03-01), Endo et al.
patent: 6203898 (2001-03-01), Kohler et al.
patent: 6211065 (2001-04-01), Xi et al.
patent: 6214637 (2001-04-01), Kim et al.
patent: 6214730 (2001-04-01), Cooney, III et al.
patent: 6235629 (2001-05-01), Takenaka
patent: 6291334 (2001-09-01), Somekh
patent: 6316347 (2001-11-01), Chang et al.
patent: 6323119 (2001-11-01), Xi et al.
patent: 6331380 (2001-12-01), Ye et al.
patent: 6333255 (2001-12-01), Sekiguchi
patent: 6346747 (2002-02-01), Grill et al.
patent: 6352922 (2002-03-01), Kim
patent: 6358573 (2002-03-01), Raoux et al.
patent: 6358804 (2002-03-01), Kobayashi et al.
patent: 6380106 (2002-04-01), Lim et al.
patent: 6413852 (2002-07-01), Grill et al.
patent: 6423384 (2002-07-01), Khazeni et al.
patent: 6428894 (2002-08-01), Babich et al.
patent: 6458516 (2002-10-01), Ye et al.
patent: 6541397 (2003-04-01), Bencher
patent: 6541842 (2003-04-01), Meynen et al.
patent: 6573030 (2003-06-01), Fairbairn et al.
patent: 6596627 (2003-07-01), Mandal
patent: 6624064 (2003-09-01), Sahin et al.
patent: 6635583 (2003-10-01), Bencher et al.
patent: 6653735 (2003-11-01), Yang et al.
patent: 6841341 (2005-01-01), Fairbairn et al.
patent: 6852647 (2005-02-01), Bencher
patent: 6884733 (2005-04-01), Dakshina-Murthy et al.
patent: 6913992 (2005-07-01), Schmitt et al.
patent: 2001/0007788 (2001-07-01), Chang et al.
patent: 2002/0001778 (2002-01-01), Latchford et al.
patent: 2002/0086547 (2002-07-01), Mui et al.
patent: 2002/0090794 (2002-07-01), Chang et al.
patent: 2003/0091938 (2003-05-01), Fairbairn et al.
patent: 2003/0119307 (2003-06-01), Bekiaris et al.
patent: 2003/0186477 (2003-10-01), Bencher
patent: 2004/0023502 (2004-02-01), Tzou et al.
patent: 2004/0038537 (2004-02-01), Liu et al.
patent: 2004/0166691 (2004-08-01), Nieh et al.
patent: 2004/0180551 (2004-09-01), Biles et al.
patent: 2004/0229470 (2004-11-01), Rui et al.
patent: 2005/0202683 (2005-09-01), Wang et al.
patent: 2005/0227502 (2005-10-01), Schmitt et al.
patent: 103 28 578 (2004-02-01), None
patent: 0 381 109 (1990-01-01), None
patent: 0 901 156 (1999-03-01), None
patent: 09 045633 (1997-02-01), None
patent: 11 026578 (1999-01-01), None
patent: WO 00/05763 (2000-02-01), None
U.S. Appl. No. 10/768,724, filed Jan. 30, 2004.
U.S. Appl. No. 10/800,112, filed Mar. 12, 2004.
U.S. Appl. No. 10/799,147, filed Mar. 12, 2004.
U.S. Appl. No. 10/799,146, filed Mar. 12, 2004.
PCT International Search Report for PCT/US05/005855 dated Oct. 13, 2005.
PCT Written Opinion for PCT/US05/005855 dated Oct. 13, 2005.
PCT Notification of Transmittal of the International Search Report dated May 31, 2005 for PCT/US05/008070.
PCT International Preliminary Report on Patentability and Written Opinion for PCT/US2005/005855, dated Sep. 14, 2006.
Kim Bok Hoen
Kulkarni Priya
Kwan Michael Chiu
Luan Andy (Hsin Chiao)
M'Saad Hichem
Applied Materials Inc.
Green Phillip S
Patterson & Sheridan
Smith Matthew S.
LandOfFree
Liquid precursors for the CVD deposition of amorphous carbon... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Liquid precursors for the CVD deposition of amorphous carbon..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid precursors for the CVD deposition of amorphous carbon... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4016174