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Integration of monocrystalline oxide devices with fully...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Integration of silicon etch and chamber cleaning processes

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Integration of spin-on gap filling dielectric with W-plug withou

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
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Integration scheme for dual damascene structure

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Integration scheme for metal gap fill, with fixed abrasive CMP

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Intelligent wet etching tool as a function of chemical...

Semiconductor device manufacturing: process – Chemical etching
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Inter-layer connection structure, multilayer printed circuit...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Interconnect structure and method to achieve unlanded vias for l

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Interface control for film deposition by gas-cluster...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Interlevel dielectric composite layer for insulation of...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Intermediate transfer layers for nanoscale pattern transfer...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Inverted layer epitaxial liftoff process

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Ion implant lithography method of processing a semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Ion implantation to modulate amorphous carbon stress

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Ion recoil implantation and enhanced carrier mobility in...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
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Ion-implanted resist removal method

Semiconductor device manufacturing: process – Chemical etching – Altering etchability of substrate region by compositional or...
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Ion-Ion plasma processing with bias modulation synchronized...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Iridium etchant methods for anisotropic profile

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Iridium oxide nanostructure patterning

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Iridium oxide nanotubes and method for forming same

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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