Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
1999-01-05
2003-06-17
Kunemund, Robert (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S711000, C438S712000, C438S729000, C438S730000
Reexamination Certificate
active
06579805
ABSTRACT:
This invention pertains generally to the fabrication of semiconductor devices and, more particularly, to a method and apparatus for generating important chemical species in the deposition, etching, cleaning, and growth of various materials and layers.
It is in general an object of the invention to provide a new and improved chemical generator and method for generating chemical species at or near the location where they are to be used.
Another object of the invention is to provide a chemical generator and method of the above character which are particularly suitable for generating chemical species for use in the fabrication of semiconductor devices.
REFERENCES:
patent: 3622493 (1971-11-01), Crusco
patent: 3625846 (1971-12-01), Murdoch et al.
patent: 3652434 (1972-03-01), Bar-Nun et al.
patent: 3657107 (1972-04-01), Herriman et al.
patent: 3658673 (1972-04-01), Kugler et al.
patent: 3869616 (1975-03-01), Smars et al.
patent: 3919397 (1975-11-01), Gould
patent: 3938988 (1976-02-01), Othmer
patent: 3954954 (1976-05-01), Davis et al.
patent: 4145403 (1979-03-01), Fey et al.
patent: 4390405 (1983-06-01), Hahn et al.
patent: 4482525 (1984-11-01), Chen
patent: 4812201 (1989-03-01), Sakai et al.
patent: 4812326 (1989-03-01), Tsukazaki et al.
patent: 4883570 (1989-11-01), Efthimion et al.
patent: 4898748 (1990-02-01), Kruger, Jr.
patent: 4926001 (1990-05-01), Alagy et al.
patent: 4973773 (1990-11-01), Malone
patent: 5026464 (1991-06-01), Mizuno et al.
patent: 5338399 (1994-08-01), Yanagida
patent: 5383984 (1995-01-01), Shimada et al.
patent: 5403434 (1995-04-01), Moslehi
patent: 5531973 (1996-07-01), Sarv
patent: 5599425 (1997-02-01), Lagendijk et al.
patent: 5607602 (1997-03-01), Su et al.
patent: 5620559 (1997-04-01), Kikuchi
patent: 5652021 (1997-07-01), Hunt et al.
patent: 5665640 (1997-09-01), Foster et al.
patent: 5756402 (1998-05-01), Jimbo et al.
patent: 5853602 (1998-12-01), Shoji
Kunemund Robert
Okumoto Victor H.
Ronal Systems Corp.
Tran Binh X.
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