Calibration standard for profilometers and manufacturing procedu

Details Calibration standard for profilometers and manufacturing procedu Calibration standard for profilometers and manufacturing procedu

1997-12-09

2000-02-22

Powell, William

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

216 59, 216 84, 156345, 438 9, 438 35, H01L 2100

Patent

active

060280085

ABSTRACT:
The invention relates to calibration standards which are used chiefly for the calibration of profilometers and in atomic force- and scanning probe microscopes. The calibration standard has one step of defined height H or a multi-step system formed of several steps of the same step-height H and consisting of exactly one material. The manufacturing procedure for the calibration standard requires only a single masking layer for each of the different versions in the form of a one-step standard or a multi-step system.

REFERENCES:
patent: 5792673 (1998-08-01), Nagura
patent: 5805421 (1998-09-01), Livengood et al.

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