LandOfFree - US Patents - Listing for Etching a substrate: processes,Masking of a substrate using material resistant to an etchant

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation

Processes for fabricating device layers with ultrafine features

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist

Processing apparatus and method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist

Processing method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Radiation curable maskant and line sealer for protecting...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Reduction of reflection by amorphous carbon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Reduction of reflection by amorphous carbon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Redundantly constrained laminar structure as weak-link...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation

Scatterometry with grating to observe resist removal rate...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation

Selective formation of porous silicon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Masking of sidewall

Self-cleaning process for etching silicon-containing material

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Adhesively bonding resist to substrate

Self-limiting isotropic wet etching process

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Semiconductor manufacturing methods

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material

Semiconductor processing

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound

Shadow mask, a method of forming the shadow mask, and a...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Single silicon-on-insulator (SOI) wafer accelerometer...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Single trench alternating phase shift mask fabrication

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist

Solder mask for manufacture of printed circuit boards

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Spinodally patterned nanostructures

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Stamp for a lithographic process