4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
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Aligning polymer films

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate

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Anisotropic liquid phase photochemical etch

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
Patent

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Anisotropic wet etching of silicon

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Apparatus and method for patterning a surface

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Patent

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Application of semiconductor IC fabrication techniques to the ma

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Applying imprinting material to substrates employing...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
Reexamination Certificate

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