Processing apparatus and method

Details Processing apparatus and method Processing apparatus and method

2006-09-14

2010-12-07

Vinh, Lan (Department: 1713)

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

Mechanically forming pattern into a resist

C216S041000, C216S048000

Reexamination Certificate

active

07846346

ABSTRACT:
A processing method for transferring a relief pattern of a mold to a resist includes the steps of compressing the mold having the relief pattern against the resist on a substrate, irradiating an exposure light onto the resist through the mold, vibrating the mold and the substrate relative to each other during the irradiating step, and releasing the mold from the resist.

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patent: 2003-7597 (2003-01-01), None
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Colburn et al., “Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning” , Texas Materials Institute, The University of Texas, Austin, TX, Proceedings of the SPIE 24thInternational Symposium on Microlithography: Emerging Lithographic Technologies III, Santa Clara, CA, vol. 3676, Part One, pp. 379-389, Mar. 1999.

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