Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate
2005-10-04
2005-10-04
Huff, Mark F. (Department: 1756)
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
C216S042000, C216S044000, C216S047000, C216S048000, C216S100000, C430S320000, C430S323000, C430S324000, C205S122000, C205S135000, C205S188000, C205S324000
Reexamination Certificate
active
06951623
ABSTRACT:
The invention provides a coated metal substrate comprising a metal substrate having an outer surface, a maskant film adhered to at least a portion of the outer surface of the metal substrate, the maskant film having a pattern of scribed lines therein, and a line sealant composition applied to the scribed lines in a maskant film. Both the maskant film and the line sealant composition are preferably radiation cured and substantially solvent-free. The invention also provides a method of protecting a metal substrate from chemical exposure by utilizing the radiation-cured maskant film and line sealant composition.
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Alston & Bird LLP
Huff Mark F.
Ruggles John
The Boeing Company
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