4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
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Ultrafine fabrication method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Patent

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Ultrafine pattern forming method and ultrafine etching method us

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains organic compound
Patent

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Use of a chemically active reticle carrier for photomask...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate

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