4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
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Debris-free wafer marking method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mechanically forming pattern into a resist
Patent

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Device manufacturing method and computer program product

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate

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Dry developing method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
Reexamination Certificate

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Dry dispense of particles to form a fabrication mask

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Resist material applied in particulate form or spray
Patent

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Dry etching method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate

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Dry etching method, microfabrication process and dry etching...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate

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