Processing method

Details Processing method Processing method

2006-12-07

2010-10-05

Culbert, Roberts (Department: 1716)

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

Mechanically forming pattern into a resist

C216S054000

Reexamination Certificate

active

07807065

ABSTRACT:
A processing method for forming a first pattern on a substrate to which a resist is applied includes the steps of pressing an original having a second pattern that has a relief reverse to that of the first pattern, against the resist on the substrate, and irradiating light onto the resist via the original, wherein a size of a concave of the second pattern is greater than a size of a convex of the first pattern corresponding to the concave of the second pattern, and a size of a convex of the second pattern is smaller than a size of a concave of the first pattern corresponding to the convex of the second pattern.

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patent: 2002/0094496 (2002-07-01), Choi et al.
patent: 2004/0008334 (2004-01-01), Sreenivasan et al.
patent: H10-312957 (1998-11-01), None
patent: H11-074190 (1999-03-01), None
patent: 2000-137319 (2000-05-01), None

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