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Method for preventing the etch transfer of sidelobes in...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Method for producing a solid body including a microstructure

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method for producing semiconductor optical device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method for producing tapered waveguide

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Method for reactive ion etching and apparatus therefor

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method for removing color resist for exposure alignment

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method for removing copper oxide on the surface of a copper film

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method of adjusting natural frequency of dual-axis vibratory str

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method of demetallizing a web in an etchant bath and web...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method of dry etching for patterning refractory metal layer impr

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Masking of sidewall
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Method of dry etching with hydrogen bromide or bromide

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material
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Method of etching and etch mask

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Method of etching organic antireflection coating (ARC) layers

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Method of fabricating film carrier

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method of fabricating thermal head

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method of fine patterning semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Method of fine patterning semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is multilayer resist
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Method of forming a compliant template for UV imprinting

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method of forming a darkfield etch mask

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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Method of forming a micro pattern in semiconductor device

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
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