Method for producing a solid body including a microstructure

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Reexamination Certificate

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C216S046000, C216S051000, C216S099000, C438S542000, C438S555000, C438S694000, C438S696000, C438S705000, C438S735000, C438S743000, C438S744000, C438S947000, C205S123000, C205S135000

Reexamination Certificate

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10433875

ABSTRACT:
According to a method for producing a solid body (1) including a microstructure (2), the surface of a substrate (3) is provided with a masking layer (6) that is impermeable to a substance to be applied. The substance is then incorporated into the substrate regions not covered by the masking layer (6). A heat treatment is used to diffuse the substance into a substrate region covered by the masking layer (6) such that a concentration gradient of the substance is created in the substrate region covered by the masking layer (6), proceeding from the edge of the masking layer (6) inward with increasing distance from the edge. The masking layer (6) is then removed to expose the substrate region under this layer, and a near-surface layer of the substrate (3) in the exposed substrate region is converted by a chemical conversion reaction into a coating (9) which has a layer thickness profile corresponding to the concentration gradient of the substance contained in this near-surface layer. A supplementary treatment is implemented in a subsection of the coating (9) in which the thickness of the coating (9) is reduced.

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