Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Patent
1994-06-03
1996-01-09
Powell, William
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
216 92, 216101, 216106, 134 27, B44C 122, C23F 100
Patent
active
054821746
ABSTRACT:
A method for removing copper oxide on a surface of a copper film is comprising the steps of treating the surface of the copper film with acid, neutralizing the surface of the copper film treated with acid, and washing the neutralized surface of the copper film.
REFERENCES:
patent: 2326837 (1943-08-01), Coleman
patent: 3067070 (1962-12-01), Louck
patent: 3072502 (1963-01-01), Alfano
Namiki Takahisa
Yamagishi Yasuo
Yano Ei
Fujitsu Limited
Powell William
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