Method for removing copper oxide on the surface of a copper film

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

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216 92, 216101, 216106, 134 27, B44C 122, C23F 100

Patent

active

054821746

ABSTRACT:
A method for removing copper oxide on a surface of a copper film is comprising the steps of treating the surface of the copper film with acid, neutralizing the surface of the copper film treated with acid, and washing the neutralized surface of the copper film.

REFERENCES:
patent: 2326837 (1943-08-01), Coleman
patent: 3067070 (1962-12-01), Louck
patent: 3072502 (1963-01-01), Alfano

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