Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate
2006-10-17
2006-10-17
Norton, Nadine (Department: 1765)
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
C257S692000
Reexamination Certificate
active
07122124
ABSTRACT:
A method of fabricating a film carrier is provided. The method comprises the steps of providing a film; forming a metallic layer on the film, patterning the metallic layer by etching to form a plurality of metallic leads; and, patterning the film by etching to form a plurality of openings so that processing time and manufacturing cost are reduced.
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patent: 5025348 (1991-06-01), Suzuki et al.
patent: 5038996 (1991-08-01), Wilcox et al.
patent: 5217849 (1993-06-01), Chonan et al.
patent: 6130110 (2000-10-01), Hashimoto
patent: 2003/0170444 (2003-09-01), Stewart
Hu Dyi-Chung
Huang Chih-Kung
Wu Chien-Nan
Dahimene Mahmoud
Jianq Chyun IP Office
Kingtron Electronics Co., Ltd.
Norton Nadine
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