Method of fabricating film carrier

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Reexamination Certificate

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C257S692000

Reexamination Certificate

active

07122124

ABSTRACT:
A method of fabricating a film carrier is provided. The method comprises the steps of providing a film; forming a metallic layer on the film, patterning the metallic layer by etching to form a plurality of metallic leads; and, patterning the film by etching to form a plurality of openings so that processing time and manufacturing cost are reduced.

REFERENCES:
patent: 5025348 (1991-06-01), Suzuki et al.
patent: 5038996 (1991-08-01), Wilcox et al.
patent: 5217849 (1993-06-01), Chonan et al.
patent: 6130110 (2000-10-01), Hashimoto
patent: 2003/0170444 (2003-09-01), Stewart

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