Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate
2007-10-09
2007-10-09
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
C216S002000, C216S039000, C216S054000, C216S066000, C430S311000, C430S312000
Reexamination Certificate
active
11298244
ABSTRACT:
A method of forming a lithographic template having an elastomer layer positioned between a body and an imprinting layer, the imprinting layer having a pattern formed thereon.
REFERENCES:
patent: 3677178 (1972-07-01), Gipe
patent: 6743368 (2004-06-01), Lee
patent: 6808646 (2004-10-01), Jeans
Sreenivasan Sidlgata V.
Voisin Ronald D.
Watts Michael P. C.
Ahmed Shamim
Carter Michael D.
Fish & Richardson P.C.
Molecular Imprints, Inc.
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