Method of forming a compliant template for UV imprinting

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Reexamination Certificate

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Details

C216S002000, C216S039000, C216S054000, C216S066000, C430S311000, C430S312000

Reexamination Certificate

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11298244

ABSTRACT:
A method of forming a lithographic template having an elastomer layer positioned between a body and an imprinting layer, the imprinting layer having a pattern formed thereon.

REFERENCES:
patent: 3677178 (1972-07-01), Gipe
patent: 6743368 (2004-06-01), Lee
patent: 6808646 (2004-10-01), Jeans

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