Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Patent
1996-05-21
1998-09-08
Breneman, R. Bruce
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
437228, H01L 22027
Patent
active
058040870
ABSTRACT:
There is provided a method of adjusting the natural frequency of a dual-axis vibratory structure having: a first spring member having a lengthwise direction coinciding to a first axis direction receiving an electrostatic force; a second spring member having a lengthwise direction coinciding to a second direction perpendicular to the first axis direction and having a width narrower than that of the first spring member; and a mass portion, the method comprising the steps of: measuring the natural frequencies relative to the first axis direction of the vibratory structure and a third axis direction perpendicular to a plane formed by the first and second axes; varying the thickness of the first spring member so as to adjust the natural frequency of the third axis direction while fixing the natural frequency of the first axis direction; and repeating the measuring step and the thickness varying step until the natural frequency of the first and third axes directions are within the scope of a permissible error. The method can be adjusted to coincide the natural frequency of the vibratory structure with a design value, so that linearity and the sensitivity of a sensor are improved and operation bandwidth increases.
REFERENCES:
patent: 4699006 (1987-10-01), Boxenhorn
patent: 5490420 (1996-02-01), Burdess
patent: 5507911 (1996-04-01), Greiff
Cho Young-ho
Lee Ki-bang
Song Ci-moo
Adjodha Michael
Breneman R. Bruce
Korea Advanced Institute of Science and Technology
Samsung Electronics Co,. Ltd.
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