Semiconductor processor with wafer face protection

Details Semiconductor processor with wafer face protection Semiconductor processor with wafer face protection

1998-03-23

2000-02-08

Powell, William

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 2, 438729, 156345, H01L 2100, B44C 122

Patent

active

060224843

ABSTRACT:
A semiconductor processing station which utilizes a processing head and processing base which are complementary to enclose a processing chamber. The processing head shown has a rotor with two portions both of which rotate. The rotor has axial movable portions which include a piece holder. The piece holder supports a wafer or other semiconductor piece being processed. The piece holder can be axially extended and retracted relative to a thin membrane which acts as a cover to prevent chemicals from reaching the back side of the wafer during processing.

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