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CMOS SiGe channel pFET and Si channel nFET devices with...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS silicide metal gate integration

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS structure including differential channel stressing...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS structure with maximized polysilicon gate activation...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS structure with non-epitaxial raised source/drain and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS thin film transistor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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CMOS transistor and method for manufacturing the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS transistor and method of fabricating the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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CMOS transistor and method of manufacture thereof

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS transistor using high stress liner layer

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS transistor with amorphous silicon elevated source-drain...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS transistor with high drive current and low sheet...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS vertical replacement gate (VRG) transistors

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS well structure and method of forming the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS with strained silicon channel NMOS and silicon...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOS-TFT Array substrate and method for fabricating the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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CMOS-type semiconductor device and method of fabricating the...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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CMOSFET and method for fabricating the same

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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CMP-free disposable gate process

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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Co-implantation of arsenic and phosphorus in extended drain regi

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
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