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Methods for forming a lanthanum-metal oxide dielectric layer

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for forming a silicon oxide layer over a substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for forming a spin-on-glass layer

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Methods for forming a thin film on an integrated circuit...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Methods for forming an enriched metal oxide surface

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Methods for forming an enriched metal oxide surface

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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Methods for forming an enriched metal oxide surface for use...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for forming dielectric materials and methods for...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Methods for forming films having high dielectric constants

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for forming high density, conformal, silica...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for forming metal oxide layers with enhanced purity

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for forming metal-containing films using metal...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for forming porous insulator structures on...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for forming silicon dioxide layers on substrates...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Methods for forming silicon nitride layers on silicon-comprising

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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Methods for forming thin film layers by simultaneous doping...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for forming ultra thin structures on a substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for identifying and removing an oxide-induced dead...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Combined with the removal of material by nonchemical means
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Methods for improving quality of semiconductor oxide...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Methods for improving within-wafer uniformity of gate oxide

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