Use of a plasma source to form a layer during the formation...
Use of cyclic siloxanes for hardness improvement of low k...
Use of enhanced turbomolecular pump for gapfill deposition...
Use of fluorine implantation to form a charge balanced...
Use of inductively-coupled plasma in plasma-enhanced...
Use of linear injectors to deposit uniform selective ozone...
Use of linear injectors to deposit uniform selective ozone...
Use of linear injectors to deposit uniform selective ozone...
Use of multifunctional si-based oligomer/polymer for the...
Use of oxalyl chloride to form chloride-doped silicon dioxide fi
Use of phoslon (PNO) for borderless contact fabrication,...
Use of selective ozone TEOS oxide to create variable...
Use of SiD.sub.4 for deposition of ultra thin and controllable o
Using H2anneal to improve the electrical characteristics of...
Using polydentate ligands for sealing pores in low-k...
UV cure process and tool for low k film formation
UV pretreatment process for ultra-thin oxynitride formation
UV-enhanced oxy-nitridation of semiconductor substrates
Vacuum exhausting apparatus, semiconductor manufacturing apparat
Vacuum processing method and semiconductor device...