Vacuum exhausting apparatus, semiconductor manufacturing apparat

Details Vacuum exhausting apparatus, semiconductor manufacturing apparat Vacuum exhausting apparatus, semiconductor manufacturing apparat

1996-05-24

1999-01-26

Bueker, Richard

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

427294, 438758, 118715, 118 50, C23C 1600

Patent

active

058638423

ABSTRACT:
A vacuum exhausting apparatus, a semiconductor manufacturing apparatus, and a vacuum processing method in which high performance semiconductor device can be manufactured with high stability and high yield. The present invention comprises a turbo-molecular pump and an auxiliary pump connected to an exhaust side of the turbo-molecular pump, and provides a gas introducing section for introducing a specified gas into an area between the turbo-molecular pump and the auxiliary pump, in which gas inside the vacuum chamber is exhausted while a specified gas is being introduced thereinto from the introducing section.

REFERENCES:
patent: 5079031 (1992-01-01), Yamazaki

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