Rapid thermal etch and rapid thermal oxidation

Reactive gaseous deposition precursor feed apparatus

Reactor design for reduced particulate generation

Reactor design for reduced particulate generation

Reactor for processing a workpiece using sonic energy

Reactor precoating for reduced stress and uniform CVD

Recovery of hydrophobicity of low-k and ultra low-k...

Reduced particulate etching

Reduced water adsorption for interlayer dielectric

Reducing line to line capacitance using oriented dielectric...

Reduction of black silicon in semiconductor fabrication

Reduction of charge loss in nonvolatile memory cells by phosphor

Reduction of etch-rate drift in HDP processes

Reduction of mobile ion and metal contamination in HDP-CVD chamb

Reduction of n-channel parasitic transistor leakage by using low

Reduction of plasma damage for HDP-CVD PSG process

Reduction of polysilicon contact resistance by nitrogen implanta

Reduction of shrinkage of poly(arylene ether) for low-K IMD

RELACS process to double the frequency or pitch of small...

Relaxed SiGe platform for high speed CMOS electronics and...