Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
Reexamination Certificate
2007-08-14
2007-08-14
Le, Dung A. (Department: 2818)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Multiple layers
C438S285000, C438S286000, C438S508000
Reexamination Certificate
active
10967998
ABSTRACT:
Structures and methods for fabricating high speed digital, analog, and combined digital/analog systems using planarized relaxed SiGe as the materials platform. The relaxed SiGe allows for a plethora of strained Si layers that possess enhanced electronic properties. By allowing the MOSFET channel to be either at the surface or buried, one can create high-speed digital and/or analog circuits. The planarization before the device epitaxial layers are deposited ensures a flat surface for state-of-the-art lithography.
REFERENCES:
patent: 4010045 (1977-03-01), Ruehrwein
patent: 4522662 (1985-06-01), Bradbury et al.
patent: 4710788 (1987-12-01), Dambkes et al.
patent: 4717681 (1988-01-01), Curran
patent: 4749441 (1988-06-01), Christenson et al.
patent: 4755478 (1988-07-01), Abernathey et al.
patent: 4786615 (1988-11-01), Liaw et al.
patent: 4803539 (1989-02-01), Psaras et al.
patent: 4963506 (1990-10-01), Liaw et al.
patent: 4969031 (1990-11-01), Kobayashi et al.
patent: 4987462 (1991-01-01), Kim et al.
patent: 4990979 (1991-02-01), Otto
patent: 4997776 (1991-03-01), Harame et al.
patent: 5013681 (1991-05-01), Godbey et al.
patent: 5034348 (1991-07-01), Hartswick et al.
patent: 5089872 (1992-02-01), Ozturk et al.
patent: 5091767 (1992-02-01), Bean et al.
patent: 5108946 (1992-04-01), Zdebel et al.
patent: 5155571 (1992-10-01), Wang et al.
patent: 5166084 (1992-11-01), Pfiester
patent: 5177583 (1993-01-01), Endo et al.
patent: 5198689 (1993-03-01), Fujioka et al.
patent: 5202284 (1993-04-01), Kamins et al.
patent: 5207864 (1993-05-01), Bhat et al.
patent: 5208182 (1993-05-01), Narayan et al.
patent: 5212110 (1993-05-01), Pfiester et al.
patent: 5212112 (1993-05-01), Lynch
patent: 5217923 (1993-06-01), Suguro et al.
patent: 5221413 (1993-06-01), Brasen et al.
patent: 5225703 (1993-07-01), Nakatani et al.
patent: 5240876 (1993-08-01), Gaul et al.
patent: 5241197 (1993-08-01), Murakami et al.
patent: 5242847 (1993-09-01), Ozturk et al.
patent: 5243207 (1993-09-01), Plumton et al.
patent: 5250445 (1993-10-01), Bean et al.
patent: 5285086 (1994-02-01), Fitzgerald
patent: 5291439 (1994-03-01), Kauffmann et al.
patent: 5294564 (1994-03-01), Karapiperis et al.
patent: 5298452 (1994-03-01), Meyerson
patent: 5304834 (1994-04-01), Lynch
patent: 5310451 (1994-05-01), Tejwani et al.
patent: 5316958 (1994-05-01), Meyerson
patent: 5334861 (1994-08-01), Pfiester et al.
patent: 5336903 (1994-08-01), Ozturk et al.
patent: 5346840 (1994-09-01), Fujioka et al.
patent: 5346848 (1994-09-01), Grupen-Shemansky et al.
patent: 5374564 (1994-12-01), Bruel
patent: 5399522 (1995-03-01), Ohori
patent: 5413679 (1995-05-01), Godbey
patent: 5424243 (1995-06-01), Takasaki
patent: 5426069 (1995-06-01), Selvakumar et al.
patent: 5426316 (1995-06-01), Mohammad
patent: 5442205 (1995-08-01), Brasen et al.
patent: 5461243 (1995-10-01), Ek et al.
patent: 5461250 (1995-10-01), Burghartz et al.
patent: 5462883 (1995-10-01), Dennard et al.
patent: 5476813 (1995-12-01), Naruse
patent: 5479033 (1995-12-01), Baca et al.
patent: 5484664 (1996-01-01), Kitahara et al.
patent: 5496750 (1996-03-01), Moslehi
patent: 5496771 (1996-03-01), Cronin et al.
patent: 5523243 (1996-06-01), Mohammad
patent: 5523592 (1996-06-01), Nakagawa et al.
patent: 5534713 (1996-07-01), Ismail et al.
patent: 5536361 (1996-07-01), Kondo et al.
patent: 5540785 (1996-07-01), Dennard et al.
patent: 5571373 (1996-11-01), Krishna et al.
patent: 5572043 (1996-11-01), Shimizu et al.
patent: 5596527 (1997-01-01), Tomioka et al.
patent: 5617351 (1997-04-01), Bertin et al.
patent: 5630905 (1997-05-01), Lynch et al.
patent: 5633202 (1997-05-01), Brigham et al.
patent: 5659187 (1997-08-01), Legoues et al.
patent: 5659194 (1997-08-01), Iwamatsu et al.
patent: 5683934 (1997-11-01), Candelaria
patent: 5698869 (1997-12-01), Yoshimi et al.
patent: 5705421 (1998-01-01), Matsushita et al.
patent: 5710450 (1998-01-01), Chau et al.
patent: 5714777 (1998-02-01), Ismail et al.
patent: 5728623 (1998-03-01), Mori
patent: 5739567 (1998-04-01), Wong
patent: 5759898 (1998-06-01), Ek et al.
patent: 5777347 (1998-07-01), Bartelink
patent: 5786612 (1998-07-01), Otani et al.
patent: 5786614 (1998-07-01), Chuang et al.
patent: 5792679 (1998-08-01), Nakato
patent: 5808344 (1998-09-01), Ismail et al.
patent: 5821577 (1998-10-01), Crabbé et al.
patent: 5844260 (1998-12-01), Ohori et al.
patent: 5847419 (1998-12-01), Imai et al.
patent: 5869359 (1999-02-01), Prabhakar
patent: 5877070 (1999-03-01), Goesele et al.
patent: 5877535 (1999-03-01), Matsumoto et al.
patent: 5891769 (1999-04-01), Liaw et al.
patent: 5906708 (1999-05-01), Robinson et al.
patent: 5906951 (1999-05-01), Chu et al.
patent: 5912479 (1999-06-01), Mori et al.
patent: 5933741 (1999-08-01), Tseng et al.
patent: 5943560 (1999-08-01), Chang et al.
patent: 5963817 (1999-10-01), Chu et al.
patent: 5966622 (1999-10-01), Levine et al.
patent: 5976939 (1999-11-01), Thompson et al.
patent: 5998807 (1999-12-01), Lustig et al.
patent: 6008111 (1999-12-01), Fushida et al.
patent: 6013134 (2000-01-01), Chu et al.
patent: 6030887 (2000-02-01), Desai et al.
patent: 6030889 (2000-02-01), Aulicino et al.
patent: 6033974 (2000-03-01), Henley et al.
patent: 6033995 (2000-03-01), Muller
patent: 6058044 (2000-05-01), Sugiura et al.
patent: 6059895 (2000-05-01), Chu et al.
patent: 6066563 (2000-05-01), Nagashima et al.
patent: 6074919 (2000-06-01), Gardner et al.
patent: 6096590 (2000-08-01), Chan et al.
patent: 6096647 (2000-08-01), Yang et al.
patent: 6103559 (2000-08-01), Gardner et al.
patent: 6107653 (2000-08-01), Fitzgerald
patent: 6111267 (2000-08-01), Fischer et al.
patent: 6117750 (2000-09-01), Bensahel et al.
patent: 6121100 (2000-09-01), Andideh et al.
patent: 6130453 (2000-10-01), Mei et al.
patent: 6132806 (2000-10-01), Dutartre
patent: 6133124 (2000-10-01), Horstmann et al.
patent: 6133799 (2000-10-01), Favors et al.
patent: 6140687 (2000-10-01), Shimomura et al.
patent: 6143636 (2000-11-01), Forbes et al.
patent: 6153495 (2000-11-01), Kub et al.
patent: 6154475 (2000-11-01), Soref et al.
patent: 6159852 (2000-12-01), Nuttall et al.
patent: 6159856 (2000-12-01), Nagano et al.
patent: 6160303 (2000-12-01), Fattaruso
patent: 6162688 (2000-12-01), Gardner et al.
patent: 6184111 (2001-02-01), Henley et al.
patent: 6187657 (2001-02-01), Xiang et al.
patent: 6191007 (2001-02-01), Matsui et al.
patent: 6191432 (2001-02-01), Sugiyama et al.
patent: 6194722 (2001-02-01), Fiorini et al.
patent: 6204529 (2001-03-01), Lung et al.
patent: 6207977 (2001-03-01), Augusto
patent: 6210988 (2001-04-01), Howe et al.
patent: 6214679 (2001-04-01), Murthy et al.
patent: 6218677 (2001-04-01), Broekaert
patent: 6228694 (2001-05-01), Doyle et al.
patent: 6232138 (2001-05-01), Fitzgerald et al.
patent: 6235567 (2001-05-01), Huang
patent: 6235568 (2001-05-01), Murthy et al.
patent: 6235575 (2001-05-01), Kasai et al.
patent: 6242324 (2001-06-01), Kub et al.
patent: 6242327 (2001-06-01), Yokoyama et al.
patent: 6246077 (2001-06-01), Kobayashi et al.
patent: 6249022 (2001-06-01), Lin et al.
patent: 6251755 (2001-06-01), Furukawa et al.
patent: 6251780 (2001-06-01), Sohn et al.
patent: 6261929 (2001-07-01), Gehrke et al.
patent: 6266278 (2001-07-01), Harari et al.
patent: 6268257 (2001-07-01), Wieczorek et al.
patent: 6271551 (2001-08-01), Schmitz et al.
patent: 6271726 (2001-08-01), Fransis et al.
patent: 6281532 (2001-08-01), Doyle et al.
patent: 6291321 (2001-09-01), Fitzgerald
patent: 6294448 (2001-09-01), Chang et al.
patent: 6306698 (2001-10-01), Wieczorek et al.
patent: 6313016 (2001-11-01), Kibbel et al.
patent: 6313486 (2001-11-01), Kencke et al.
patent: 6315384 (2001-11-01), Ramaswami et al.
patent: 6316301 (2001-11-01), Kant
patent: 6316357 (2001-11-01), Lin et al.
patent: 6319799 (2001-11-01), Ouyang et al.
patent: 6319805 (2001-11-01), Iwamatsu et al.
patent: 6323108 (2001-11-01), Kub et al.
patent: 6326281 (2001-12-01), Violette et al.
patent: 6326664 (2001-12-01), Chau et al.
patent: 6329063 (2001-12-01), Lo et al.
patent: 6335546 (2002-01-01), Tsuda et al.
patent: 6339232 (2002-01-01), Takagi
patent: 6342421 (2002-01-01), Mitani et al.
patent: 63443
AmberWave Systems Corporation
Goodwin & Procter LLP
Le Dung A.
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