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Integrated circuitry and semiconductor processing method of form

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Integration of buried oxide layers with crystalline layers

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Interfacial oxidation process for high-k gate dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Interfacial oxidation process for high-k gate dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Intermittent pulsed oxidation process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Intrinsic dual gate oxide MOSFET using a damascene gate process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Ion implanted microscale and nanoscale device method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Ion-assisted oxidation methods and the resulting structures

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Ion-assisted oxidation methods and the resulting structures

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Ion-assisted oxidation methods and the resulting structures

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Layering nitrided oxide on a silicon substrate

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Liquid phase deposition method for growing a titanium dioxide on

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low dielectric (low k) barrier films with oxygen doping by...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low dielectric constant dielectric films and process for making

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low metallic impurity SiO based thin film dielectrics on...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low temperature method for forming a thin, uniform oxide

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Low-K Dielectric layer and method of making same

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Low-temperature plasma-enhanced chemical vapor deposition of...

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Lower temperature method for forming high quality...

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Magnetic tunnel junction device with improved barrier layer

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