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In situ dielectric stacks

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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In situ rapid thermal etch and rapid thermal oxidation

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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In-line processing for forming a silicon nitride film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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In-situ oxide capping after CVD low k deposition

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Incorporation of nitrogen into high k dielectric film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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InN/InP/TiO 2 photosensitized electrode

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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InN/TiO 2 photosensitized electrode

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Insulating film and method of forming the same

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Insulating film forming method and substrate processing method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Insulation structure for high temperature conditions and...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Integrated ashing and implant annealing method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Integrated ashing and implant annealing method using ozone

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Integrated circuitry and semiconductor processing method of form

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Integration of buried oxide layers with crystalline layers

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Interfacial oxidation process for high-k gate dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Interfacial oxidation process for high-k gate dielectric...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Intermittent pulsed oxidation process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Intrinsic dual gate oxide MOSFET using a damascene gate process

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Ion implanted microscale and nanoscale device method

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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Ion-assisted oxidation methods and the resulting structures

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